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Information card for entry 7050790
Preview
Coordinates | 7050790.cif |
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Original paper (by DOI) | HTML |
Formula | C16 H30 N2 Ni O4 |
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Calculated formula | C16 H30 N2 Ni O4 |
SMILES | [Ni]123(OC(=CC(=[O]1)C)C)([N](C)(C)CC[N]2(C)C)OC(=CC(=[O]3)C)C |
Title of publication | Sol-gel processing of alkoxysilyl-substituted nickel complexes for the preparation of highly dispersed nickel in silicaElectronic supplementary information (ESI) available: Tables S1‒S5 giving additional analytical data as described in the text and the exact quantities for the syntheses. See http://www.rsc.org/suppdata/nj/b1/b110612k/ |
Authors of publication | Trimmel, Gregor; Lembacher, Christian; Kickelbick, Guido; Schubert, Ulrich |
Journal of publication | New Journal of Chemistry |
Year of publication | 2002 |
Journal volume | 26 |
Journal issue | 6 |
Pages of publication | 759 |
a | 8.5048 ± 0.0003 Å |
b | 10.2119 ± 0.0004 Å |
c | 11.522 ± 0.0004 Å |
α | 90° |
β | 92.241 ± 0.001° |
γ | 90° |
Cell volume | 999.92 ± 0.06 Å3 |
Cell temperature | 293 ± 2 K |
Ambient diffraction temperature | 293 ± 2 K |
Number of distinct elements | 5 |
Space group number | 7 |
Hermann-Mauguin space group symbol | P 1 n 1 |
Hall space group symbol | P -2yac |
Residual factor for all reflections | 0.0584 |
Residual factor for significantly intense reflections | 0.0477 |
Weighted residual factors for all reflections | 0.1288 |
Weighted residual factors for significantly intense reflections | 0.1226 |
Goodness-of-fit parameter for all reflections | 1.045 |
Goodness-of-fit parameter for significantly intense reflections | 1.022 |
Diffraction radiation wavelength | 0.71073 Å |
Diffraction radiation type | MoKα |
Has coordinates | Yes |
Has disorder | No |
Has Fobs | No |
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