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Information card for entry 7053520
Preview
Coordinates | 7053520.cif |
---|---|
Original paper (by DOI) | HTML |
Formula | C22 H45 N Si5 |
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Calculated formula | C22 H45 N Si5 |
SMILES | [Si]1(=Nc2ccccc2)C([Si](C)(C)C)([Si](C)(C)C)CCC1([Si](C)(C)C)[Si](C)(C)C |
Title of publication | Synthesis and structure of stable base-free dialkylsilanimines |
Authors of publication | Iwamoto, Takeaki; Ohnishi, Nobuyoshi; Gui, Zhenyu; Ishida, Shintaro; Isobe, Hiroyuki; Maeda, Satoshi; Ohno, Koichi; Kira, Mitsuo |
Journal of publication | New Journal of Chemistry |
Year of publication | 2010 |
Journal volume | 34 |
Journal issue | 8 |
Pages of publication | 1637 |
a | 9.1616 ± 0.0009 Å |
b | 20.601 ± 0.002 Å |
c | 14.7242 ± 0.0014 Å |
α | 90° |
β | 93.934 ± 0.001° |
γ | 90° |
Cell volume | 2772.5 ± 0.5 Å3 |
Cell temperature | 100 K |
Ambient diffraction temperature | 100 K |
Number of distinct elements | 4 |
Space group number | 14 |
Hermann-Mauguin space group symbol | P 1 21/n 1 |
Hall space group symbol | -P 2yn |
Residual factor for all reflections | 0.028 |
Residual factor for significantly intense reflections | 0.025 |
Weighted residual factors for significantly intense reflections | 0.0692 |
Weighted residual factors for all reflections included in the refinement | 0.0719 |
Goodness-of-fit parameter for all reflections included in the refinement | 1.049 |
Diffraction radiation wavelength | 0.71073 Å |
Diffraction radiation type | MoKα |
Has coordinates | Yes |
Has disorder | No |
Has Fobs | No |
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