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Information card for entry 7104089
Preview
| Coordinates | 7104089.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | C68 H86 O6 Si2 Zr |
|---|---|
| Calculated formula | C68 H86 O6 Si2 Zr |
| SMILES | [Zr]123456(Oc7c(cc(cc7C(C)(C)C)C(C)(C)C)[c]72[cH]3[cH]4[c]25[c]67cccc2)(Oc2c([Si](C)(C)C)cc3ccccc3c2c2c(O1)c([Si](C)(C)C)cc1ccccc21)([O]1CCCC1)[O]1CCCC1.O1CCCC1.c1(ccccc1)C |
| Title of publication | Facile resolution of constrained geometry indenyl-phenoxide ligation. |
| Authors of publication | Turner, Luke E; Thorn, Matthew G; Fanwick, Phillip E; Rothwell, Ian P |
| Journal of publication | Chemical communications (Cambridge, England) |
| Year of publication | 2003 |
| Journal issue | 9 |
| Pages of publication | 1034 - 1035 |
| a | 12.5231 ± 0.0003 Å |
| b | 19.2231 ± 0.0004 Å |
| c | 25.9127 ± 0.0006 Å |
| α | 90° |
| β | 90° |
| γ | 90° |
| Cell volume | 6238 ± 0.4 Å3 |
| Cell temperature | 150 K |
| Ambient diffraction temperature | 150 K |
| Number of distinct elements | 5 |
| Space group number | 19 |
| Hermann-Mauguin space group symbol | P 21 21 21 |
| Hall space group symbol | P 2ac 2ab |
| Residual factor for significantly intense reflections | 0.063 |
| Weighted residual factors for all reflections included in the refinement | 0.136 |
| Goodness-of-fit parameter for all reflections included in the refinement | 1.124 |
| Diffraction radiation wavelength | 0.71073 Å |
| Diffraction radiation type | MO-Kα |
| Duplicate of | 7113885 |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
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The link is: https://www.crystallography.net/7104089.html
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