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Information card for entry 7104380
Preview
Coordinates | 7104380.cif |
---|---|
Original paper (by DOI) | HTML |
Formula | C58 H50 B2 Cl6 F4 N8 Ni |
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Calculated formula | C58 H50 B2 Cl6 F4 N8 Ni |
SMILES | Cc1ccc2C(=c3ccc(C)[n]3[B](n12)(F)F)c1ccc(cc1)C1=c2ccc(C)[n]2[Ni]2(n3c1ccc3C)[n]1c(C)ccc1=C(c1ccc(C3=c4ccc(C)[n]4[B](n4c3ccc4C)(F)F)cc1)c1ccc(C)n21.C(Cl)(Cl)Cl.C(Cl)(Cl)Cl |
Title of publication | Self-assembly of oligomeric linear dipyrromethene metal complexes. |
Authors of publication | Miao, Qing; Shin, Ji-Young; Patrick, Brian O; Dolphin, David |
Journal of publication | Chemical communications (Cambridge, England) |
Year of publication | 2009 |
Journal volume | 34 |
Journal issue | 18 |
Pages of publication | 2541 - 2543 |
a | 10.84 ± 0.001 Å |
b | 14.501 ± 0.002 Å |
c | 19.83 ± 0.002 Å |
α | 109.761 ± 0.006° |
β | 104.839 ± 0.006° |
γ | 93.027 ± 0.006° |
Cell volume | 2802.2 ± 0.5 Å3 |
Cell temperature | 173 ± 2 K |
Ambient diffraction temperature | 173 ± 2 K |
Number of distinct elements | 7 |
Space group number | 2 |
Hermann-Mauguin space group symbol | P -1 |
Hall space group symbol | -P 1 |
Residual factor for all reflections | 0.1281 |
Residual factor for significantly intense reflections | 0.0752 |
Weighted residual factors for significantly intense reflections | 0.204 |
Weighted residual factors for all reflections included in the refinement | 0.2302 |
Goodness-of-fit parameter for all reflections included in the refinement | 1.039 |
Diffraction radiation wavelength | 0.71069 Å |
Diffraction radiation type | MoKα |
Has coordinates | Yes |
Has disorder | No |
Has Fobs | No |
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