Information card for entry 7105248
Formula |
C21 H26 N4 O5 |
Calculated formula |
C21 H26 N4 O5 |
SMILES |
CC(=O)Nc1cc(ccc1)C(=O)N(CC(=O)Nc1cc(ccc1)C(=O)N(C)C)C.O |
Title of publication |
A hydrogen bonding motif for forming extended assemblies. |
Authors of publication |
Zhang, Jiahui; Wu, Xiangxiang; Yamato, Kazuhiro; Liu, Futao; Su, Tianyi; Zheng, Chong; He, Lan; Gong, Bing |
Journal of publication |
Chemical communications (Cambridge, England) |
Year of publication |
2010 |
Journal volume |
46 |
Journal issue |
7 |
Pages of publication |
1062 - 1064 |
a |
13.7983 ± 0.0003 Å |
b |
7.5207 ± 0.0002 Å |
c |
21.252 ± 0.0005 Å |
α |
90° |
β |
102.834 ± 0.002° |
γ |
90° |
Cell volume |
2150.29 ± 0.09 Å3 |
Cell temperature |
296 ± 2 K |
Ambient diffraction temperature |
296 ± 2 K |
Number of distinct elements |
4 |
Space group number |
14 |
Hermann-Mauguin space group symbol |
P 1 21/c 1 |
Hall space group symbol |
-P 2ybc |
Residual factor for all reflections |
0.078 |
Residual factor for significantly intense reflections |
0.0527 |
Weighted residual factors for significantly intense reflections |
0.1471 |
Weighted residual factors for all reflections included in the refinement |
0.1657 |
Goodness-of-fit parameter for all reflections included in the refinement |
1.035 |
Diffraction radiation wavelength |
0.71073 Å |
Diffraction radiation type |
MoKα |
Has coordinates |
Yes |
Has disorder |
No |
Has Fobs |
No |
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https://www.crystallography.net/7105248.html