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Information card for entry 7108588
Preview
Coordinates | 7108588.cif |
---|---|
Original paper (by DOI) | HTML |
Formula | C29 H30 B F12 O4 P Si3 |
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Calculated formula | C29 H30 B F12 O4 P Si3 |
SMILES | P(C(=[O][B](c1c(c(cc(c1F)F)F)F)(c1c(c(cc(c1F)F)F)F)c1c(c(cc(c1F)F)F)F)O[Si](C)(C)C)=C(O[Si](C)(C)C)O[Si](C)(C)C |
Title of publication | Silyl-migrations in frustrated Lewis pair chemistry: reactions of (CH3)3Si)3P and B(C6F4H)3 with H2 and CO2 |
Authors of publication | Katsuhiko Takeuchi; Douglas W. Stephan |
Journal of publication | Chem.Commun. |
Year of publication | 2012 |
Journal volume | 48 |
Pages of publication | 11304 |
a | 10.8454 ± 0.0004 Å |
b | 11.2438 ± 0.0004 Å |
c | 15.412 ± 0.0006 Å |
α | 84.657 ± 0.002° |
β | 87.652 ± 0.001° |
γ | 85.639 ± 0.002° |
Cell volume | 1864.72 ± 0.12 Å3 |
Cell temperature | 150 ± 2 K |
Ambient diffraction temperature | 150 ± 2 K |
Number of distinct elements | 7 |
Space group number | 2 |
Hermann-Mauguin space group symbol | P -1 |
Hall space group symbol | -P 1 |
Residual factor for all reflections | 0.0631 |
Residual factor for significantly intense reflections | 0.0404 |
Weighted residual factors for significantly intense reflections | 0.0907 |
Weighted residual factors for all reflections included in the refinement | 0.1021 |
Goodness-of-fit parameter for all reflections included in the refinement | 1.019 |
Diffraction radiation wavelength | 0.71073 Å |
Diffraction radiation type | MoKα |
Has coordinates | Yes |
Has disorder | No |
Has Fobs | No |
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The link is: https://www.crystallography.net/7108588.html
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