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Information card for entry 7109364
Preview
Coordinates | 7109364.cif |
---|---|
Original paper (by DOI) | HTML |
Formula | C60 H84 S6 Si4 |
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Calculated formula | C60 H84 S6 Si4 |
SMILES | s1c2c3c4c1c(sc4c1sc(C#C[Si](C(C)C)(C(C)C)C(C)C)c4sc5c(sc(c5c14)c3sc2C#C[Si](C(C)C)(C(C)C)C(C)C)C#C[Si](C(C)C)(C(C)C)C(C)C)C#C[Si](C(C)C)(C(C)C)C(C)C |
Title of publication | Antiaromatic planar cyclooctatetraene: a strategy for developing ambipolar semiconductors for field effect transistors |
Authors of publication | Tohru Nishinaga; Takeshi Ohmae; Kazunari Aita; Masayoshi Takase; Masahiko Iyoda; Tatsuya Arai; Yoshihito Kunugi |
Journal of publication | Chem.Commun. |
Year of publication | 2013 |
Journal volume | 49 |
Pages of publication | 5354 |
a | 14.7404 ± 0.0014 Å |
b | 15.015 ± 0.0015 Å |
c | 15.4645 ± 0.0015 Å |
α | 71.01 ± 0.002° |
β | 87.452 ± 0.002° |
γ | 74.597 ± 0.002° |
Cell volume | 3116.9 ± 0.5 Å3 |
Cell temperature | 123 ± 2 K |
Ambient diffraction temperature | 123 ± 2 K |
Number of distinct elements | 4 |
Space group number | 2 |
Hermann-Mauguin space group symbol | P -1 |
Hall space group symbol | -P 1 |
Residual factor for all reflections | 0.0555 |
Residual factor for significantly intense reflections | 0.0419 |
Weighted residual factors for significantly intense reflections | 0.1174 |
Weighted residual factors for all reflections included in the refinement | 0.1378 |
Goodness-of-fit parameter for all reflections included in the refinement | 1.052 |
Diffraction radiation wavelength | 0.71073 Å |
Diffraction radiation type | MoKα |
Has coordinates | Yes |
Has disorder | No |
Has Fobs | No |
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The link is: https://www.crystallography.net/7109364.html
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Users of the data should acknowledge the original authors of the
structural data.