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Information card for entry 7110323
Preview
Coordinates | 7110323.cif |
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Original paper (by DOI) | HTML |
Formula | C22 H40 Hf O8 |
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Calculated formula | C22 H40 Hf O8 |
SMILES | C1(=CC(OC(C)(C)C)=[O][Hf]2(O1)(OC(C)C)(OC(=CC(OC(C)(C)C)=[O]2)C)OC(C)C)C |
Title of publication | Mononuclear precursor for MOCVD of HfO2 thin filmsElectronic supplementary information (ESI) available: TG/DTA, and isothermal studies, RBS and AFM data of HfO2 film. See http://www.rsc.org/suppdata/cc/b4/b405015k/ |
Authors of publication | Baunemann, Arne; Thomas, Reji; Becker, Ralf; Winter, Manuela; Fischer, Roland A.; Ehrhart, Peter; Waser, Rainer; Devi, Anjana |
Journal of publication | Chemical Communications |
Year of publication | 2004 |
Journal issue | 14 |
Pages of publication | 1610 - 1611 |
a | 9.872 ± 0.003 Å |
b | 15.312 ± 0.004 Å |
c | 18.599 ± 0.004 Å |
α | 90° |
β | 97.548 ± 0.007° |
γ | 90° |
Cell volume | 2787.1 ± 1.3 Å3 |
Cell temperature | 213 ± 2 K |
Ambient diffraction temperature | 213 ± 2 K |
Number of distinct elements | 4 |
Space group number | 15 |
Hermann-Mauguin space group symbol | C 1 2/c 1 |
Hall space group symbol | -C 2yc |
Residual factor for all reflections | 0.08 |
Residual factor for significantly intense reflections | 0.0481 |
Weighted residual factors for significantly intense reflections | 0.0864 |
Weighted residual factors for all reflections included in the refinement | 0.0954 |
Goodness-of-fit parameter for all reflections included in the refinement | 0.891 |
Diffraction radiation wavelength | 0.71073 Å |
Diffraction radiation type | MoKα |
Has coordinates | Yes |
Has disorder | No |
Has Fobs | No |
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