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Information card for entry 7110477
Preview
| Coordinates | 7110477.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | C21 H25 O Si Ta |
|---|---|
| Calculated formula | C21 H25 O Si Ta |
| SMILES | [TaH]123456789(C#[O])[c]%10([c]1([c]2([c]3([c]4%10C)C)C)C)[Si]([c]15[c]6([c]7([c]8([c]91C)C)C)C)(C)C |
| Title of publication | The ansa-effect in permethyltantalocene chemistry: a [Me2Si] ansa bridge promotes olefin-insertion and reductive-elimination reactions for [Me2Si(C5Me4)2]Ta(η2-C2H4)H and [Me2Si(C5Me4)2]TaH3 |
| Authors of publication | Shin, Jun Ho; Parkin, Gerard |
| Journal of publication | Chemical Communications |
| Year of publication | 1999 |
| Journal issue | 10 |
| Pages of publication | 887 |
| a | 8.6366 ± 0.0005 Å |
| b | 15.9753 ± 0.0009 Å |
| c | 14.8619 ± 0.0008 Å |
| α | 90° |
| β | 100.539 ± 0.001° |
| γ | 90° |
| Cell volume | 2015.9 ± 0.2 Å3 |
| Cell temperature | 203 ± 2 K |
| Ambient diffraction temperature | 203 ± 2 K |
| Number of distinct elements | 5 |
| Space group number | 14 |
| Hermann-Mauguin space group symbol | P 1 21/n 1 |
| Hall space group symbol | -P 2yn |
| Residual factor for all reflections | 0.0285 |
| Residual factor for significantly intense reflections | 0.0225 |
| Weighted residual factors for all reflections | 0.0563 |
| Weighted residual factors for significantly intense reflections | 0.0535 |
| Goodness-of-fit parameter for all reflections | 1.04 |
| Goodness-of-fit parameter for significantly intense reflections | 1.073 |
| Diffraction radiation wavelength | 0.71073 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
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The link is: https://www.crystallography.net/7110477.html
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Users of the data should acknowledge the original authors of the
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