Information card for entry 7111533
| Chemical name |
trifluorido(1,4,7-trimethyl-1,4,7-triazacyclononane)silicon(IV) chloride |
| Formula |
C9 H21 Cl F3 N3 Si |
| Calculated formula |
C9 H21 Cl F3 N3 Si |
| SMILES |
C[N]12CC[N]3([Si]1(F)(F)(F)[N](C)(CC2)CC3)C.[Cl-] |
| Title of publication |
Preparation and structure of the unique silicon(iv) cation [SiF3(Me3tacn)]+ |
| Authors of publication |
Cheng, Fei; Hector, Andrew L.; Levason, William; Reid, Gillian; Webster, Michael; Zhang, Wenjian |
| Journal of publication |
Chemical Communications |
| Year of publication |
2009 |
| Journal issue |
11 |
| Pages of publication |
1334 - 1336 |
| a |
8.779 ± 0.002 Å |
| b |
8.779 ± 0.002 Å |
| c |
29.255 ± 0.002 Å |
| α |
90° |
| β |
90° |
| γ |
120° |
| Cell volume |
1952.6 ± 0.6 Å3 |
| Cell temperature |
120 ± 2 K |
| Ambient diffraction temperature |
120 ± 2 K |
| Number of distinct elements |
6 |
| Space group number |
161 |
| Hermann-Mauguin space group symbol |
R 3 c :H |
| Hall space group symbol |
R 3 -2"c |
| Residual factor for all reflections |
0.0649 |
| Residual factor for significantly intense reflections |
0.0594 |
| Weighted residual factors for significantly intense reflections |
0.1506 |
| Weighted residual factors for all reflections included in the refinement |
0.1555 |
| Goodness-of-fit parameter for all reflections included in the refinement |
1.041 |
| Diffraction radiation wavelength |
0.71073 Å |
| Diffraction radiation type |
MoKα |
| Has coordinates |
Yes |
| Has disorder |
No |
| Has Fobs |
No |
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https://www.crystallography.net/7111533.html