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Information card for entry 7111606
Preview
Coordinates | 7111606.cif |
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Original paper (by DOI) | HTML |
Common name | 3,5-Lithium oxy-1,1,1,2,3,4,5,6,7,7,7-undecamethyl-2,6- bis(trimethylsilyl)-4-(1'lithium oxy-1',2',3',3',3'-pentamethyl-2'- trimethylsilyl-trisilanyl)heptasilane |
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Chemical name | 3,5-Lithium oxy-1,1,1,2,3,4,5,6,7,7,7-undecamethyl-2,6- bis(trimethylsilyl)-4-[1'lithium oxy-1',2',3',3',3'- pentamethyl-2'-trimethylsilyl-trisilanyl]heptasilane |
Formula | C50 H150 Li6 O6 Si26 |
Calculated formula | C50 H150 Li6 O6 Si26 |
Title of publication | Discrete oxygen containing oligosilane dendrimers—modelling oxygen defects in silicon nanomaterials |
Authors of publication | Jäger-Fiedler, U.; Köckerling, M.; Reinke, H.; Krempner, C. |
Journal of publication | Chemical Communications |
Year of publication | 2010 |
Journal volume | 46 |
Journal issue | 25 |
Pages of publication | 4535 - 4537 |
a | 14.717 ± 0.003 Å |
b | 26.672 ± 0.005 Å |
c | 14.985 ± 0.003 Å |
α | 90° |
β | 114.75 ± 0.03° |
γ | 90° |
Cell volume | 5342 ± 2 Å3 |
Cell temperature | 293 ± 2 K |
Ambient diffraction temperature | 293 ± 2 K |
Number of distinct elements | 5 |
Space group number | 14 |
Hermann-Mauguin space group symbol | P 1 21/c 1 |
Hall space group symbol | -P 2ybc |
Residual factor for all reflections | 0.1088 |
Residual factor for significantly intense reflections | 0.0537 |
Weighted residual factors for significantly intense reflections | 0.1208 |
Weighted residual factors for all reflections included in the refinement | 0.1354 |
Goodness-of-fit parameter for all reflections included in the refinement | 0.861 |
Diffraction radiation wavelength | 0.71073 Å |
Diffraction radiation type | MoKα |
Has coordinates | Yes |
Has disorder | Yes |
Has Fobs | No |
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The link is: https://www.crystallography.net/7111606.html
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