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Information card for entry 7113399
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Coordinates | 7113399.cif |
---|---|
Original paper (by DOI) | HTML |
Common name | 3 |
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Chemical name | Chloro(cyclohexyl)bis[N-(dimethylamino)trifluoroacetimidato-N,O]silicon(IV) |
Formula | C14 H23 Cl F6 N4 O2 Si |
Calculated formula | C14 H23 Cl F6 N4 O2 Si |
SMILES | [Si]12(Cl)(OC(=N[N]1(C)C)C(F)(F)F)(OC(=N[N]2(C)C)C(F)(F)F)C1CCCCC1 |
Title of publication | Neutral and ionic dissociation patterns in hexacoordinate silicon chelates: a model nucleophilic substitution at pentacoordinate silicon. |
Authors of publication | Gostevskii, Boris; Adear, Keren; Sivaramakrishna, Akella; Silbert, Gilad; Stalke, Dietmar; Kocher, Nikolaus; Kalikhman, Inna; Kost, Daniel |
Journal of publication | Chemical communications (Cambridge, England) |
Year of publication | 2004 |
Journal issue | 14 |
Pages of publication | 1644 - 1645 |
a | 7.806 ± 0.002 Å |
b | 9.205 ± 0.003 Å |
c | 28.156 ± 0.008 Å |
α | 90° |
β | 94.228 ± 0.006° |
γ | 90° |
Cell volume | 2017.6 ± 1 Å3 |
Cell temperature | 100 ± 2 K |
Ambient diffraction temperature | 100 ± 2 K |
Number of distinct elements | 7 |
Space group number | 14 |
Hermann-Mauguin space group symbol | P 1 21/c 1 |
Hall space group symbol | -P 2ybc |
Residual factor for all reflections | 0.0317 |
Residual factor for significantly intense reflections | 0.03 |
Weighted residual factors for significantly intense reflections | 0.0766 |
Weighted residual factors for all reflections included in the refinement | 0.0776 |
Goodness-of-fit parameter for all reflections included in the refinement | 1.054 |
Diffraction radiation wavelength | 0.71073 Å |
Diffraction radiation type | MoKα |
Has coordinates | Yes |
Has disorder | No |
Has Fobs | No |
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The link is: https://www.crystallography.net/7113399.html
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