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Information card for entry 7114112
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Coordinates | 7114112.cif |
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Original paper (by DOI) | HTML |
Formula | C32 H45 F12 N5 O2 P2 |
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Calculated formula | C32 H45 F12 N5 O2 P2 |
Title of publication | Compartmental Schiff-base ligands as selective double-loaded extractants for copper(ii)Electronic supplementary information (ESI) available: synthetic and spectroscopic data. See http://www.rsc.org/suppdata/cc/b1/b109635b/ |
Authors of publication | Black, Daniel; Blake, Alexander J.; Finn, Rachel L.; Lindoy, Leonard F.; Nezhadali, Azizollah; Rougnaghi, Gholamhossein; Tasker, Peter A.; Schröder, Martin |
Journal of publication | Chemical Communications |
Year of publication | 2002 |
Journal issue | 4 |
Pages of publication | 340 |
a | 9.576 ± 0.003 Å |
b | 10.916 ± 0.003 Å |
c | 18.415 ± 0.004 Å |
α | 89.67 ± 0.03° |
β | 86.13 ± 0.03° |
γ | 78.81 ± 0.02° |
Cell volume | 1884 ± 0.9 Å3 |
Cell temperature | 150 ± 2 K |
Ambient diffraction temperature | 150 ± 2 K |
Number of distinct elements | 6 |
Space group number | 2 |
Hermann-Mauguin space group symbol | P -1 |
Hall space group symbol | -P 1 |
Residual factor for all reflections | 0.122 |
Residual factor for significantly intense reflections | 0.0861 |
Weighted residual factors for all reflections | 0.249 |
Weighted residual factors for significantly intense reflections | 0.206 |
Goodness-of-fit parameter for all reflections | 1.023 |
Goodness-of-fit parameter for significantly intense reflections | 1.053 |
Diffraction radiation wavelength | 0.71073 Å |
Diffraction radiation type | MoKα |
Has coordinates | Yes |
Has disorder | Yes |
Has Fobs | No |
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The link is: https://www.crystallography.net/7114112.html
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