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Information card for entry 7114365
Preview
Coordinates | 7114365.cif |
---|---|
Original paper (by DOI) | HTML |
Formula | C30 H58 Cl3 Hf N3 Si4 |
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Calculated formula | C30 H58 Cl3 Hf N3 Si4 |
SMILES | [Hf]12(Cl)(Cl)(Cl)([N](C)(C)CC[N]1(C)C)[N](=C2[Si]([Si](C)(C)C)([Si](C)(C)C)[Si](C)(C)C)c1c(cccc1C)C.c1ccccc1 |
Title of publication | First successful reaction of a silyl anion with hafnium tetrachloride |
Authors of publication | Frank, Dieter; Baumgartner, Judith; Marschner, Christoph |
Journal of publication | Chemical Communications |
Year of publication | 2002 |
Journal issue | 11 |
Pages of publication | 1190 |
a | 11.625 ± 0.002 Å |
b | 12.164 ± 0.002 Å |
c | 29.975 ± 0.006 Å |
α | 90° |
β | 90° |
γ | 90° |
Cell volume | 4238.7 ± 1.3 Å3 |
Cell temperature | 223 ± 2 K |
Ambient diffraction temperature | 223 ± 2 K |
Number of distinct elements | 6 |
Space group number | 19 |
Hermann-Mauguin space group symbol | P 21 21 21 |
Hall space group symbol | P 2ac 2ab |
Residual factor for all reflections | 0.0331 |
Residual factor for significantly intense reflections | 0.0305 |
Weighted residual factors for significantly intense reflections | 0.0786 |
Weighted residual factors for all reflections included in the refinement | 0.0797 |
Goodness-of-fit parameter for all reflections included in the refinement | 0.982 |
Diffraction radiation wavelength | 0.71073 Å |
Diffraction radiation type | MoKα |
Has coordinates | Yes |
Has disorder | No |
Has Fobs | No |
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The link is: https://www.crystallography.net/7114365.html
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