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Information card for entry 7118323
Preview
Coordinates | 7118323.cif |
---|---|
Original paper (by DOI) | HTML |
Formula | C10 H12 I N2 O3.5 |
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Calculated formula | C10 H12 I N2 O3.5 |
SMILES | [I]([O]=n1ccccc1C)N1C(=O)CCC1=O.O |
Title of publication | Very strong (-)N-X(+)(-)O-N(+) halogen bonds. |
Authors of publication | Puttreddy, Rakesh; Jurček, Ondřej; Bhowmik, Sandip; Mäkelä, Toni; Rissanen, Kari |
Journal of publication | Chemical communications (Cambridge, England) |
Year of publication | 2016 |
Journal volume | 52 |
Journal issue | 11 |
Pages of publication | 2338 - 2341 |
a | 9.7294 ± 0.0019 Å |
b | 11.427 ± 0.002 Å |
c | 11.566 ± 0.002 Å |
α | 90.02 ± 0.03° |
β | 110.88 ± 0.03° |
γ | 93.06 ± 0.03° |
Cell volume | 1199.5 ± 0.4 Å3 |
Cell temperature | 170 K |
Ambient diffraction temperature | 170 K |
Number of distinct elements | 5 |
Space group number | 2 |
Hermann-Mauguin space group symbol | P -1 |
Hall space group symbol | -P 1 |
Residual factor for all reflections | 0.0273 |
Residual factor for significantly intense reflections | 0.0229 |
Weighted residual factors for significantly intense reflections | 0.0479 |
Weighted residual factors for all reflections included in the refinement | 0.0494 |
Goodness-of-fit parameter for all reflections included in the refinement | 1.044 |
Diffraction radiation wavelength | 0.71073 Å |
Diffraction radiation type | MoKα |
Has coordinates | Yes |
Has disorder | No |
Has Fobs | No |
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The link is: https://www.crystallography.net/7118323.html
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