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Information card for entry 7118326
Preview
Coordinates | 7118326.cif |
---|---|
Original paper (by DOI) | HTML |
Formula | C13 H11 I N2 O4 S |
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Calculated formula | C13 H11 I N2 O4 S |
SMILES | [I]([O]=n1ccccc1C)N1S(=O)(=O)c2c(C1=O)cccc2 |
Title of publication | Very strong (-)N-X(+)(-)O-N(+) halogen bonds. |
Authors of publication | Puttreddy, Rakesh; Jurček, Ondřej; Bhowmik, Sandip; Mäkelä, Toni; Rissanen, Kari |
Journal of publication | Chemical communications (Cambridge, England) |
Year of publication | 2016 |
Journal volume | 52 |
Journal issue | 11 |
Pages of publication | 2338 - 2341 |
a | 7.2705 ± 0.0015 Å |
b | 8.7631 ± 0.0018 Å |
c | 12.765 ± 0.003 Å |
α | 109.12 ± 0.03° |
β | 99.97 ± 0.03° |
γ | 90.54 ± 0.03° |
Cell volume | 754.9 ± 0.3 Å3 |
Cell temperature | 170 K |
Ambient diffraction temperature | 170 K |
Number of distinct elements | 6 |
Space group number | 2 |
Hermann-Mauguin space group symbol | P -1 |
Hall space group symbol | -P 1 |
Residual factor for all reflections | 0.0307 |
Residual factor for significantly intense reflections | 0.0264 |
Weighted residual factors for significantly intense reflections | 0.0593 |
Weighted residual factors for all reflections included in the refinement | 0.0606 |
Goodness-of-fit parameter for all reflections included in the refinement | 1.063 |
Diffraction radiation wavelength | 0.71073 Å |
Diffraction radiation type | MoKα |
Has coordinates | Yes |
Has disorder | No |
Has Fobs | No |
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