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Information card for entry 7118328
Preview
Coordinates | 7118328.cif |
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Original paper (by DOI) | HTML |
Formula | C12 H10 N2 O4 S |
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Calculated formula | C12 H10 N2 O4 S |
SMILES | S1(=O)(=O)NC(=O)c2c1cccc2.O=n1ccccc1 |
Title of publication | Very strong (-)N-X(+)(-)O-N(+) halogen bonds. |
Authors of publication | Puttreddy, Rakesh; Jurček, Ondřej; Bhowmik, Sandip; Mäkelä, Toni; Rissanen, Kari |
Journal of publication | Chemical communications (Cambridge, England) |
Year of publication | 2016 |
Journal volume | 52 |
Journal issue | 11 |
Pages of publication | 2338 - 2341 |
a | 6.8571 ± 0.0004 Å |
b | 8.4482 ± 0.0005 Å |
c | 11.3117 ± 0.0006 Å |
α | 98.755 ± 0.005° |
β | 106.766 ± 0.005° |
γ | 93.582 ± 0.005° |
Cell volume | 616.19 ± 0.06 Å3 |
Cell temperature | 123 K |
Ambient diffraction temperature | 123 K |
Number of distinct elements | 5 |
Space group number | 2 |
Hermann-Mauguin space group symbol | P -1 |
Hall space group symbol | -P 1 |
Residual factor for all reflections | 0.0434 |
Residual factor for significantly intense reflections | 0.0374 |
Weighted residual factors for significantly intense reflections | 0.0969 |
Weighted residual factors for all reflections included in the refinement | 0.1015 |
Goodness-of-fit parameter for all reflections included in the refinement | 1.163 |
Diffraction radiation probe | x-ray |
Diffraction radiation wavelength | 0.71073 Å |
Diffraction radiation type | MoKα |
Has coordinates | Yes |
Has disorder | No |
Has Fobs | No |
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