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Information card for entry 7118646
Preview
Coordinates | 7118646.cif |
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Original paper (by DOI) | HTML |
Formula | C26 H14 F8 I2 N4 |
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Calculated formula | C26 H14 F8 I2 N4 |
SMILES | c1cc(ccn1)C=C.c1(c(F)c(F)c(c(F)c1F)/N=N/c1c(c(c(I)c(F)c1F)F)F)I.c1cc(C=C)ccn1 |
Title of publication | Azo⋯phenyl stacking: a persistent self-assembly motif guides the assembly of fluorinated cis-azobenzenes into photo-mechanical needle crystals |
Authors of publication | Bushuyev, Oleksandr S.; Tomberg, Anna; Vinden, Joanna R.; Moitessier, Nicolas; Barrett, Christopher J.; Friščić, Tomislav |
Journal of publication | Chemical Communications (Cambridge, United Kingdom) |
Year of publication | 2016 |
Journal volume | 52 |
Journal issue | 10 |
Pages of publication | 2103 - 2106 |
a | 28.3 ± 0.004 Å |
b | 5.4157 ± 0.0007 Å |
c | 17.841 ± 0.002 Å |
α | 90° |
β | 96.287 ± 0.002° |
γ | 90° |
Cell volume | 2717.9 ± 0.6 Å3 |
Cell temperature | 151 ± 2 K |
Ambient diffraction temperature | 151 ± 2 K |
Number of distinct elements | 5 |
Space group number | 15 |
Hermann-Mauguin space group symbol | C 1 2/c 1 |
Hall space group symbol | -C 2yc |
Residual factor for all reflections | 0.0294 |
Residual factor for significantly intense reflections | 0.0226 |
Weighted residual factors for significantly intense reflections | 0.0475 |
Weighted residual factors for all reflections included in the refinement | 0.05 |
Goodness-of-fit parameter for all reflections included in the refinement | 1.058 |
Diffraction radiation wavelength | 0.71073 Å |
Diffraction radiation type | MoKα |
Has coordinates | Yes |
Has disorder | No |
Has Fobs | No |
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The link is: https://www.crystallography.net/7118646.html
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