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Information card for entry 7118816
Preview
| Coordinates | 7118816.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | C63 H53 Cl2 Cu4 N13 O33 W10 |
|---|---|
| Calculated formula | C63 H51 Cl2 Cu4 N13 O33 W10 |
| Title of publication | A photosensitizing decatungstate-based MOF as heterogeneous photocatalyst for the selective C-H alkylation of aliphatic nitriles. |
| Authors of publication | Shi, Dongying; He, Cheng; Sun, Wenlong; Ming, Zheng; Meng, Changgong; Duan, Chunying |
| Journal of publication | Chemical communications (Cambridge, England) |
| Year of publication | 2016 |
| Journal volume | 52 |
| Journal issue | 25 |
| Pages of publication | 4714 - 4717 |
| a | 20.0299 ± 0.0016 Å |
| b | 17.2261 ± 0.0014 Å |
| c | 15.8221 ± 0.0013 Å |
| α | 90° |
| β | 125.919 ± 0.001° |
| γ | 90° |
| Cell volume | 4421.1 ± 0.6 Å3 |
| Cell temperature | 226 ± 2 K |
| Ambient diffraction temperature | 226 ± 2 K |
| Number of distinct elements | 7 |
| Space group number | 12 |
| Hermann-Mauguin space group symbol | C 1 2/m 1 |
| Hall space group symbol | -C 2y |
| Residual factor for all reflections | 0.064 |
| Residual factor for significantly intense reflections | 0.0405 |
| Weighted residual factors for significantly intense reflections | 0.1134 |
| Weighted residual factors for all reflections included in the refinement | 0.1306 |
| Goodness-of-fit parameter for all reflections included in the refinement | 1.006 |
| Diffraction radiation wavelength | 0.71073 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | Yes |
| Has Fobs | No |
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The link is: https://www.crystallography.net/7118816.html
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