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Information card for entry 7118816
Preview
Coordinates | 7118816.cif |
---|---|
Original paper (by DOI) | HTML |
Formula | C63 H53 Cl2 Cu4 N13 O33 W10 |
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Calculated formula | C63 H51 Cl2 Cu4 N13 O33 W10 |
Title of publication | A photosensitizing decatungstate-based MOF as heterogeneous photocatalyst for the selective C-H alkylation of aliphatic nitriles. |
Authors of publication | Shi, Dongying; He, Cheng; Sun, Wenlong; Ming, Zheng; Meng, Changgong; Duan, Chunying |
Journal of publication | Chemical communications (Cambridge, England) |
Year of publication | 2016 |
Journal volume | 52 |
Journal issue | 25 |
Pages of publication | 4714 - 4717 |
a | 20.0299 ± 0.0016 Å |
b | 17.2261 ± 0.0014 Å |
c | 15.8221 ± 0.0013 Å |
α | 90° |
β | 125.919 ± 0.001° |
γ | 90° |
Cell volume | 4421.1 ± 0.6 Å3 |
Cell temperature | 226 ± 2 K |
Ambient diffraction temperature | 226 ± 2 K |
Number of distinct elements | 7 |
Space group number | 12 |
Hermann-Mauguin space group symbol | C 1 2/m 1 |
Hall space group symbol | -C 2y |
Residual factor for all reflections | 0.064 |
Residual factor for significantly intense reflections | 0.0405 |
Weighted residual factors for significantly intense reflections | 0.1134 |
Weighted residual factors for all reflections included in the refinement | 0.1306 |
Goodness-of-fit parameter for all reflections included in the refinement | 1.006 |
Diffraction radiation wavelength | 0.71073 Å |
Diffraction radiation type | MoKα |
Has coordinates | Yes |
Has disorder | Yes |
Has Fobs | No |
For the version history of this entry, please navigate to main COD server.
The link is: https://www.crystallography.net/7118816.html
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