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Information card for entry 7119859
Preview
Coordinates | 7119859.cif |
---|---|
Original paper (by DOI) | HTML |
Formula | C48 H76 B2 Cl F4 N5 O4 |
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Calculated formula | C48 H76 B2 Cl F4 N5 O4 |
SMILES | [Cl-].F[B]1(OC(=CC(=[O]1)c1[nH]c(cc1C)C)c1[nH]c(cc1C)C)F.O1C(=CC(=[O][B]1(F)F)c1[nH]c(cc1C)C)c1[nH]c(cc1C)C.[N+](CCC)(CCC)(CCC)CCC.CCCCCC |
Title of publication | Dimension-controlled assemblies of anion-responsive π-electronic systems bearing aryl substituents with fan-shaped geometries. |
Authors of publication | Lakshmi, Vellanki; Haketa, Yohei; Yamakado, Ryohei; Yasuda, Nobuhiro; Maeda, Hiromitsu |
Journal of publication | Chemical communications (Cambridge, England) |
Year of publication | 2017 |
Journal volume | 53 |
Journal issue | 27 |
Pages of publication | 3834 - 3837 |
a | 11.592 ± 0.004 Å |
b | 29.363 ± 0.009 Å |
c | 15.588 ± 0.005 Å |
α | 90° |
β | 104.696 ± 0.005° |
γ | 90° |
Cell volume | 5132 ± 3 Å3 |
Cell temperature | 93 ± 2 K |
Ambient diffraction temperature | 93 ± 2 K |
Number of distinct elements | 7 |
Space group number | 14 |
Hermann-Mauguin space group symbol | P 1 21/c 1 |
Hall space group symbol | -P 2ybc |
Residual factor for all reflections | 0.1545 |
Residual factor for significantly intense reflections | 0.107 |
Weighted residual factors for significantly intense reflections | 0.2918 |
Weighted residual factors for all reflections included in the refinement | 0.318 |
Goodness-of-fit parameter for all reflections included in the refinement | 1.047 |
Diffraction radiation wavelength | 1.54187 Å |
Diffraction radiation type | CuKα |
Has coordinates | Yes |
Has disorder | No |
Has Fobs | No |
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