Information card for entry 7120477
| Formula |
C55 H81 N3 O Si |
| Calculated formula |
C55 H81 N3 O Si |
| SMILES |
[SiH]([O-])(Nc1c(cccc1C(C)C)C(C)C)c1c(c2c(C(C)C)cc(cc2C(C)C)C(C)C)cccc1c1c(C(C)C)cc(cc1C(C)C)C(C)C.n1(c[n+](c(c1C)C)C)C |
| Title of publication |
NHC-stabilized 1-hydrosilaimine: synthesis, structure and reactivity |
| Authors of publication |
Dhara, Debabrata; Vijayakanth, Thangavel; Barman, Milan Kr.; Naik, Khevath Praveen Kumar; Chrysochos, Nicolas; Yildiz, Cem B.; Boomishankar, Ramamoorthy; Schulzke, Carola; Chandrasekhar, Vadapalli; Jana, Anukul |
| Journal of publication |
Chem. Commun. |
| Year of publication |
2017 |
| a |
14.73 ± 0.006 Å |
| b |
17.458 ± 0.008 Å |
| c |
24.128 ± 0.01 Å |
| α |
90° |
| β |
91.47 ± 0.009° |
| γ |
90° |
| Cell volume |
6203 ± 5 Å3 |
| Cell temperature |
100 ± 2 K |
| Ambient diffraction temperature |
100 ± 2 K |
| Number of distinct elements |
5 |
| Space group number |
14 |
| Hermann-Mauguin space group symbol |
P 1 21/c 1 |
| Hall space group symbol |
-P 2ybc |
| Residual factor for all reflections |
0.1841 |
| Residual factor for significantly intense reflections |
0.0731 |
| Weighted residual factors for significantly intense reflections |
0.1926 |
| Weighted residual factors for all reflections included in the refinement |
0.2444 |
| Goodness-of-fit parameter for all reflections included in the refinement |
1.017 |
| Diffraction radiation wavelength |
0.71073 Å |
| Diffraction radiation type |
MoKα |
| Has coordinates |
Yes |
| Has disorder |
No |
| Has Fobs |
No |
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