Information card for entry 7203103

Structure parameters

• Formula: C30 H58 Hf N2 O8
• Calculated formula: C30 H58 Hf N2 O8
• Title of publication: Mixed amide‒malonate compound of hafnium as a novel monomeric precursor for MOCVD of HfO2 thin films
• Authors of publication: Milanov, A.; Bhakta, R.; Thomas, R.; Ehrhart, P.; Winter, M.; Waser, R.; Devi, A.
• Journal of publication: Journal of Materials Chemistry
• Year of publication: 2006
• Journal volume: 16
• Journal issue: 5
• Pages of publication: 437
• a: 13.3247 ± 0.0011 Å
• b: 16.22 ± 0.0014 Å
• c: 17.2825 ± 0.0014 Å
• α: 83.458 ± 0.005°
• β: 86.262 ± 0.007°
• γ: 84.888 ± 0.007°
• Cell volume: 3690.4 ± 0.5 ų
• Cell temperature: 100 ± 2 K
• Ambient diffraction temperature: 100 ± 2 K
• Number of distinct elements: 5
• Space group number: 2
• Hermann-Mauguin space group symbol: P -1
• Hall space group symbol: -P 1
• Residual factor for all reflections: 0.0716
• Residual factor for significantly intense reflections: 0.0525
• Weighted residual factors for significantly intense reflections: 0.1344
• Weighted residual factors for all reflections included in the refinement: 0.1506
• Goodness-of-fit parameter for all reflections included in the refinement: 0.975
• Diffraction radiation wavelength: 0.71073 Å
• Diffraction radiation type: MoKα
• Has coordinates: Yes
• Has disorder: Yes
• Has Fobs: No