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Information card for entry 7203356
Preview
Coordinates | 7203356.cif |
---|---|
Original paper (by DOI) | HTML |
Formula | C20 H50 N5 Ta |
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Calculated formula | C20 H50 N5 Ta |
Title of publication | Tantalum(v) diethylamide, [Ta(NEt2)5]: a potentially important and crystalline precursor for the CVD of oxides containing tantalum |
Authors of publication | Davies, Hywel O.; Jones, Anthony C.; McKinnell, Elizabeth A.; Raftery, James; Muryn, Christopher A.; Afzaal, Mohammad; O'Brien, Paul |
Journal of publication | Journal of Materials Chemistry |
Year of publication | 2006 |
Journal volume | 16 |
Journal issue | 23 |
Pages of publication | 2226 |
a | 9.18 ± 0.0016 Å |
b | 9.2312 ± 0.0016 Å |
c | 9.2851 ± 0.0017 Å |
α | 115.971 ± 0.003° |
β | 96.663 ± 0.003° |
γ | 110.403 ± 0.002° |
Cell volume | 628.39 ± 0.19 Å3 |
Cell temperature | 100 ± 2 K |
Ambient diffraction temperature | 100 ± 2 K |
Number of distinct elements | 4 |
Space group number | 1 |
Hermann-Mauguin space group symbol | P 1 |
Hall space group symbol | P 1 |
Residual factor for all reflections | 0.0379 |
Residual factor for significantly intense reflections | 0.0349 |
Weighted residual factors for significantly intense reflections | 0.0872 |
Weighted residual factors for all reflections included in the refinement | 0.0908 |
Goodness-of-fit parameter for all reflections included in the refinement | 1.086 |
Diffraction radiation wavelength | 0.71073 Å |
Diffraction radiation type | MoKα |
Has coordinates | Yes |
Has disorder | Yes |
Has Fobs | No |
For the version history of this entry, please navigate to main COD server.
The link is: https://www.crystallography.net/7203356.html
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