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Information card for entry 7203477
Preview
Coordinates | 7203477.cif |
---|---|
Original paper (by DOI) | HTML |
Formula | C36 H30 O6 |
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Calculated formula | C36 H30 O6 |
SMILES | c1(C#Cc2cc(c(c(c2)OC)OC)OC)c2ccccc2c(C#Cc2cc(c(c(c2)OC)OC)OC)c2ccccc12 |
Title of publication | Highly soluble acenes as semiconductors for thin film transistors |
Authors of publication | Rüdiger Schmidt; Silke Göttling; Dirk Leusser; Dietmar Stalke; Ana-Maria Krause; Frank Würthner |
Journal of publication | Journal of Materials Chemistry |
Year of publication | 2006 |
Journal volume | 16 |
Journal issue | 37 |
Pages of publication | 3708 |
a | 5.0294 ± 0.0011 Å |
b | 7.4771 ± 0.0017 Å |
c | 19.701 ± 0.004 Å |
α | 97.683 ± 0.004° |
β | 92.558 ± 0.004° |
γ | 109.44 ± 0.004° |
Cell volume | 689.2 ± 0.3 Å3 |
Cell temperature | 100 ± 2 K |
Ambient diffraction temperature | 100 ± 2 K |
Number of distinct elements | 3 |
Space group number | 2 |
Hermann-Mauguin space group symbol | P -1 |
Hall space group symbol | -P 1 |
Residual factor for all reflections | 0.0649 |
Residual factor for significantly intense reflections | 0.0516 |
Weighted residual factors for significantly intense reflections | 0.126 |
Weighted residual factors for all reflections included in the refinement | 0.1326 |
Goodness-of-fit parameter for all reflections included in the refinement | 1.084 |
Diffraction radiation wavelength | 0.71073 Å |
Diffraction radiation type | MoKα |
Has coordinates | Yes |
Has disorder | No |
Has Fobs | No |
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