Information card for entry 7204329
Formula |
? |
Calculated formula |
C34 N16 O2 S10 |
SMILES |
C1(SC2=C(OCCO2)S1)C1SC2=C(SCCS2)S1.C(#N)C(=c1c2c(c(=C(C#N)C#N)c3c1nsn3)nsn2)C#N.C(#N)C(C#N)=c1c2c(c(c3c1nsn3)=C(C#N)C#N)nsn2 |
Title of publication |
Complex formation of ethylenedioxyethylenedithiotetrathiafulvalene (EDOEDT-TTF: EOET) and its self-assembling ability |
Authors of publication |
Saito, Gunzi; Sasaki, Hiroshi; Aoki, Takashi; Yoshida, Yukihiro; Otsuka, Akihiro; Yamochi, Hideki; Drozdova, Olga O.; Yakushi, Kyuya; Kitagawa, Hiroshi; Mitani, Tadaoki |
Journal of publication |
Journal of Materials Chemistry |
Year of publication |
2002 |
Journal volume |
12 |
Journal issue |
6 |
Pages of publication |
1640 |
a |
7.541 ± 0.001 Å |
b |
9.169 ± 0.0008 Å |
c |
15.216 ± 0.002 Å |
α |
93.948 ± 0.007° |
β |
101.68 ± 0.006° |
γ |
106.924 ± 0.008° |
Cell volume |
976.5 ± 0.2 Å3 |
Cell temperature |
295 ± 2 K |
Number of distinct elements |
4 |
Space group number |
1 |
Hermann-Mauguin space group symbol |
P 1 |
Hall space group symbol |
P 1 |
Residual factor for significantly intense reflections |
0.063 |
Weighted residual factors for significantly intense reflections |
0.161 |
Goodness-of-fit parameter for significantly intense reflections |
1.264 |
Diffraction radiation wavelength |
0.71073 Å |
Diffraction radiation type |
MoK-alpha |
Has coordinates |
Yes |
Has disorder |
No |
Has Fobs |
No |
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https://www.crystallography.net/7204329.html