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Information card for entry 7204480
Preview
Coordinates | 7204480.cif |
---|---|
Original paper (by DOI) | HTML |
Formula | C14 H20 Cu F12 N2 O4 |
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Calculated formula | C14 H20 Cu F12 N2 O4 |
Title of publication | Fluorinated aminoalkoxide CuII complexes: new CVD precursors for deposition of copper metal |
Authors of publication | Chi, Yun; Hsu, Peng-Fu; Liu, Chao-Shiuan; Ching, Wei-Li; Chou, Tsung-Yi; Carty, Arthur J.; Peng, Shie-Ming; Lee, Gene-Hsiang; Chuang, Shiow-Huey |
Journal of publication | Journal of Materials Chemistry |
Year of publication | 2002 |
Journal volume | 12 |
Journal issue | 12 |
Pages of publication | 3541 |
a | 11.0215 ± 0.0002 Å |
b | 12.7768 ± 0.0002 Å |
c | 13.2584 ± 0.0001 Å |
α | 98.494 ± 0.001° |
β | 102.203 ± 0.001° |
γ | 114.022 ± 0.001° |
Cell volume | 1608.65 ± 0.05 Å3 |
Cell temperature | 295 ± 2 K |
Ambient diffraction temperature | 295 ± 2 K |
Number of distinct elements | 6 |
Space group number | 2 |
Hermann-Mauguin space group symbol | P -1 |
Hall space group symbol | -P 1 |
Residual factor for all reflections | 0.0614 |
Residual factor for significantly intense reflections | 0.0435 |
Weighted residual factors for all reflections | 0.1011 |
Weighted residual factors for significantly intense reflections | 0.0932 |
Goodness-of-fit parameter for all reflections | 1.013 |
Goodness-of-fit parameter for significantly intense reflections | 1.034 |
Diffraction radiation wavelength | 0.71073 Å |
Diffraction radiation type | MoKα |
Has coordinates | Yes |
Has disorder | No |
Has Fobs | No |
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