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Information card for entry 7210488
Preview
Coordinates | 7210488.cif |
---|---|
Original paper (by DOI) | HTML |
Formula | C26 H44 Cl2 Cu2 N10 O20 |
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Calculated formula | C26 H44 Cl2 Cu2 N10 O20 |
SMILES | [Cu]12(Cl)(Oc3c(cc(cc3)N(=O)=O)C=[N]1[C@H](C(=O)O2)CCCNC(=[NH2+])N)[OH2].O.[Cu]12(Oc3c(cc(cc3)N(=O)=O)C=[N]1[C@H](C(=O)O2)CCCNC(=[NH2+])N)([OH2])[OH2].Cl(=O)(=O)(=O)[O-].O.O |
Title of publication | Supramolecular assembly of a new series of copper-l-arginine Schiff bases |
Authors of publication | New, Siu Yee; Thio, Yude; Koh, Lip Lin; Andy Hor, T. S.; Xue, Feng |
Journal of publication | CrystEngComm |
Year of publication | 2011 |
Journal volume | 13 |
Journal issue | 6 |
Pages of publication | 2114 |
a | 8.2119 ± 0.0008 Å |
b | 8.7239 ± 0.0009 Å |
c | 14.2024 ± 0.0014 Å |
α | 90.923 ± 0.002° |
β | 96.679 ± 0.002° |
γ | 99.903 ± 0.002° |
Cell volume | 994.82 ± 0.17 Å3 |
Cell temperature | 223 ± 2 K |
Ambient diffraction temperature | 223 ± 2 K |
Number of distinct elements | 6 |
Space group number | 1 |
Hermann-Mauguin space group symbol | P 1 |
Hall space group symbol | P 1 |
Residual factor for all reflections | 0.0415 |
Residual factor for significantly intense reflections | 0.0382 |
Weighted residual factors for significantly intense reflections | 0.0832 |
Weighted residual factors for all reflections included in the refinement | 0.0846 |
Goodness-of-fit parameter for all reflections included in the refinement | 1.01 |
Diffraction radiation wavelength | 0.71073 Å |
Diffraction radiation type | MoKα |
Has coordinates | Yes |
Has disorder | No |
Has Fobs | No |
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The link is: https://www.crystallography.net/7210488.html
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Users of the data should acknowledge the original authors of the
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