Information card for entry 7218477
| Chemical name |
6,6'-(((2R,3R)-butane-2,3-diyl)bis(oxy)) bis(1,2,4,5-tetrafluoro-3-iodobenzene), tetraethylammonium bromide |
| Formula |
C24 H28 Br F8 I2 N O2 |
| Calculated formula |
C24 H28 Br F8 I2 N O2 |
| SMILES |
[Br-].Ic1c(F)c(F)c(O[C@@H]([C@H](Oc2c(F)c(F)c(I)c(F)c2F)C)C)c(F)c1F.[N+](CC)(CC)(CC)CC |
| Title of publication |
Halogen-bonded halide networks from chiral neutral spacers |
| Authors of publication |
Lieffrig, Julien; Niassy, Arnode G.; Jeannin, Olivier; Fourmigué, Marc |
| Journal of publication |
CrystEngComm |
| Year of publication |
2015 |
| Journal volume |
17 |
| Journal issue |
1 |
| Pages of publication |
50 |
| a |
13.2765 ± 0.0002 Å |
| b |
15.9187 ± 0.0002 Å |
| c |
14.6917 ± 0.0002 Å |
| α |
90° |
| β |
102.437 ± 0.008° |
| γ |
90° |
| Cell volume |
3032.15 ± 0.12 Å3 |
| Cell temperature |
293 ± 2 K |
| Ambient diffraction temperature |
293 ± 2 K |
| Number of distinct elements |
7 |
| Space group number |
4 |
| Hermann-Mauguin space group symbol |
P 1 21 1 |
| Hall space group symbol |
P 2yb |
| Residual factor for all reflections |
0.0832 |
| Residual factor for significantly intense reflections |
0.0367 |
| Weighted residual factors for significantly intense reflections |
0.0658 |
| Weighted residual factors for all reflections included in the refinement |
0.0888 |
| Goodness-of-fit parameter for all reflections included in the refinement |
1.128 |
| Diffraction radiation wavelength |
0.71073 Å |
| Diffraction radiation type |
MoKα |
| Has coordinates |
Yes |
| Has disorder |
No |
| Has Fobs |
No |
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https://www.crystallography.net/7218477.html