Information card for entry 7228746
| Common name |
Epalerstat. DMF solvate |
| Chemical name |
2-[(5Z)-5-[(E)-2-methyl-3-phenylprop-2-enylidene]-4-oxo-2-sulfanylidene-1,3-thiazolidin-3-yl] |
| Formula |
C18 H20 N2 O4 S2 |
| Calculated formula |
C18 H20 N2 O4 S2 |
| SMILES |
C(=O)N(C)C.C(=O)(CN1C(=S)S/C(=C\C(=C\c2ccccc2)\C)C1=O)O |
| Title of publication |
Solubility improvement of epalrestat by layered structure formation via cocrystallization |
| Authors of publication |
Putra, Okky Dwichandra; Umeda, Daiki; Nugraha, Yuda Prasetya; Furuishi, Takayuki; Fukuzawa, Kaori; Nagase, Hiromasa; Uekusa, Hidehiro; Yonemochi, Etsuo |
| Journal of publication |
CrystEngComm |
| Year of publication |
2017 |
| a |
7.6999 ± 0.0003 Å |
| b |
8.7601 ± 0.0003 Å |
| c |
15.1662 ± 0.0005 Å |
| α |
102.148 ± 0.007° |
| β |
95.754 ± 0.007° |
| γ |
110.011 ± 0.008° |
| Cell volume |
923.03 ± 0.09 Å3 |
| Cell temperature |
93 ± 2 K |
| Ambient diffraction temperature |
93 ± 2 K |
| Number of distinct elements |
5 |
| Space group number |
2 |
| Hermann-Mauguin space group symbol |
P -1 |
| Hall space group symbol |
-P 1 |
| Residual factor for all reflections |
0.0386 |
| Residual factor for significantly intense reflections |
0.0357 |
| Weighted residual factors for significantly intense reflections |
0.0945 |
| Weighted residual factors for all reflections included in the refinement |
0.097 |
| Goodness-of-fit parameter for all reflections included in the refinement |
1.09 |
| Diffraction radiation wavelength |
1.54187 Å |
| Diffraction radiation type |
CuKα |
| Has coordinates |
Yes |
| Has disorder |
No |
| Has Fobs |
No |
For the version history of this entry, please navigate to main COD server.
The link is:
https://www.crystallography.net/7228746.html