Crystallography Open Database

Information card for entry 7234589

Preview

Coordinates	7234589.cif
Original paper (by DOI)	HTML

Structure parameters

Formula	C32 H64 O6 P2 Ru
Calculated formula	C32 H64 O6 P2 Ru
Title of publication	Chemical vapor deposition of ruthenium-based layers by a single-source approach
Authors of publication	Janine Jeschke; Stefan Mockel; Marcus Korb; Tobias Ruffer; Khaybar Assim; Marcel Melzer; Gordon Herwig; Colin Georgi; Stefan E. Schulz; Heinrich Lang
Journal of publication	Journal of Materials Chemistry C
Year of publication	2016
Journal volume	4
Pages of publication	2319 - 2328
a	8.7593 ± 0.0004 Å
b	13.946 ± 0.0005 Å
c	15.6865 ± 0.0005 Å
α	90°
β	95.93 ± 0.003°
γ	90°
Cell volume	1905.96 ± 0.13 Å³
Cell temperature	110 ± 2 K
Ambient diffraction temperature	110 ± 2 K
Number of distinct elements	5
Space group number	13
Hermann-Mauguin space group symbol	P 1 2/c 1
Hall space group symbol	-P 2yc
Residual factor for all reflections	0.0376
Residual factor for significantly intense reflections	0.0318
Weighted residual factors for significantly intense reflections	0.0696
Weighted residual factors for all reflections included in the refinement	0.0715
Goodness-of-fit parameter for all reflections included in the refinement	1.082
Diffraction radiation wavelength	0.71073 Å
Diffraction radiation type	MoKα
Has coordinates	Yes
Has disorder	No
Has F_obs	No

For the version history of this entry, please navigate to main COD server.
The link is: https://www.crystallography.net/7234589.html