Information card for entry 7701297
| Formula |
C19 H20 F N Si |
| Calculated formula |
C19 H20 F N Si |
| Title of publication |
Complementary bonding analysis of the N – Si interaction in pentacoordinated silicon compounds using quantum crystallography |
| Authors of publication |
Fugel, Malte; Ponomarenko, Maksym; Hesse, Maxie F.; Malaspina, Lorraine Andrade; Kleemiss, Florian; Sugimoto, Kunihisa; Genoni, Alessandro; Röschenthaler, Gerd-Volker; Grabowsky, Simon |
| Journal of publication |
Dalton Transactions |
| Year of publication |
2019 |
| a |
9.5986 ± 0.0019 Å |
| b |
11.43 ± 0.002 Å |
| c |
29.056 ± 0.006 Å |
| α |
90° |
| β |
90° |
| γ |
90° |
| Cell volume |
3187.8 ± 1.1 Å3 |
| Cell temperature |
25 ± 2 K |
| Ambient diffraction temperature |
25 ± 2 K |
| Number of distinct elements |
5 |
| Space group number |
19 |
| Hermann-Mauguin space group symbol |
P 21 21 21 |
| Hall space group symbol |
P 2ac 2ab |
| Residual factor for all reflections |
0.0244 |
| Residual factor for significantly intense reflections |
0.0244 |
| Weighted residual factors for all reflections |
0.0207 |
| Weighted residual factors for significantly intense reflections |
0.0207 |
| RFsqd |
0.0398 |
| Goodness-of-fit parameter for all reflections |
3.5364 |
| Goodness-of-fit parameter for significantly intense reflections |
3.5364 |
| Diffraction radiation wavelength |
0.4133 Å |
| Diffraction radiation type |
synchrotron |
| Has coordinates |
Yes |
| Has disorder |
No |
| Has Fobs |
No |
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The link is:
https://www.crystallography.net/7701297.html
