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Information card for entry 7705529
Preview
Coordinates | 7705529.cif |
---|---|
Original paper (by DOI) | HTML |
Formula | C55 H62 N3 O P2 S3 Si3 V |
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Calculated formula | C55 H62 N3 O P2 S3 Si3 V |
SMILES | [V]123(Sc4c([P]3(c3cccc([Si](C)(C)C)c3S1)c1cccc([Si](C)(C)C)c1S2)cccc4[Si](C)(C)C)N=O.[P+](c1ccccc1)(c1ccccc1)(c1ccccc1)c1ccccc1.N#CC.N#CC |
Title of publication | The dual roles of a V(III) centre for substrate binding and oxygen atom abstraction; nitrite reduction mediated by a V(III) complex. |
Authors of publication | Pan, Hung-Ruei; Wu, Zong-Han; Kuo, Chin-Ting; Ou, Han-Jang; Lee, Gene-Hsiang; Hsu, Hua-Fen |
Journal of publication | Dalton transactions (Cambridge, England : 2003) |
Year of publication | 2020 |
Journal volume | 49 |
Journal issue | 41 |
Pages of publication | 14393 - 14396 |
a | 13.1191 ± 0.0002 Å |
b | 23.2974 ± 0.0005 Å |
c | 18.4253 ± 0.0003 Å |
α | 90° |
β | 94.8117 ± 0.0004° |
γ | 90° |
Cell volume | 5611.68 ± 0.17 Å3 |
Cell temperature | 150 ± 2 K |
Ambient diffraction temperature | 150 ± 2 K |
Number of distinct elements | 8 |
Space group number | 14 |
Hermann-Mauguin space group symbol | P 1 21/c 1 |
Hall space group symbol | -P 2ybc |
Residual factor for all reflections | 0.0471 |
Residual factor for significantly intense reflections | 0.0357 |
Weighted residual factors for significantly intense reflections | 0.0842 |
Weighted residual factors for all reflections included in the refinement | 0.0913 |
Goodness-of-fit parameter for all reflections included in the refinement | 1.033 |
Diffraction radiation wavelength | 0.71073 Å |
Diffraction radiation type | MoKα |
Has coordinates | Yes |
Has disorder | No |
Has Fobs | No |
For the version history of this entry, please navigate to main COD server.
The link is: https://www.crystallography.net/7705529.html
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Users of the data should acknowledge the original authors of the
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