Information card for entry 7713575
| Formula |
C24 H48 Er N3 O3 |
| Calculated formula |
C24 H48 Er N3 O3 |
| Title of publication |
Thermal atomic layer deposition of Er2O3 films from a volatile, thermally stable enaminolate precursor |
| Authors of publication |
Jayakodiarachci, Navoda; Liu, Rui; Dharmadasa, Chamod; Hu, Xiaobing; Savage, Don; Ward, Cassandra L.; Evans, Paul G.; Winter, Charles |
| Journal of publication |
Dalton Transactions |
| Year of publication |
2023 |
| a |
9.8012 ± 0.0007 Å |
| b |
21.698 ± 0.0015 Å |
| c |
14.4627 ± 0.0011 Å |
| α |
90° |
| β |
108.316 ± 0.003° |
| γ |
90° |
| Cell volume |
2919.9 ± 0.4 Å3 |
| Cell temperature |
102 K |
| Ambient diffraction temperature |
102 K |
| Number of distinct elements |
5 |
| Space group number |
14 |
| Hermann-Mauguin space group symbol |
P 1 21/n 1 |
| Hall space group symbol |
-P 2yn |
| Residual factor for all reflections |
0.019 |
| Residual factor for significantly intense reflections |
0.0164 |
| Weighted residual factors for significantly intense reflections |
0.0358 |
| Weighted residual factors for all reflections included in the refinement |
0.0366 |
| Goodness-of-fit parameter for all reflections included in the refinement |
1.033 |
| Diffraction radiation wavelength |
0.71073 Å |
| Diffraction radiation type |
MoKα |
| Has coordinates |
Yes |
| Has disorder |
No |
| Has Fobs |
No |
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https://www.crystallography.net/7713575.html
