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Information card for entry 1520600
Preview
| Coordinates | 1520600.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | C46 H70 N2 Si2 |
|---|---|
| Calculated formula | C46 H70 N2 Si2 |
| SMILES | [Si]([Si]=C1N(c2c(cccc2C(C)C)C(C)C)C(CC21CCCCC2)(C)C)=C1N(C(CC21CCCCC2)(C)C)c1c(cccc1C(C)C)C(C)C |
| Title of publication | A soluble molecular variant of the semiconducting silicondiselenide |
| Authors of publication | Chandra Mondal, Kartik; Roy, Sudipta; Dittrich, Birger; Maity, Bholanath; Dutta, Sayan; Koley, Debasis; Vasa, Suresh Kumar; Linser, Rasmus; Dechert, Sebastian; Roesky, Herbert W. |
| Journal of publication | Chem. Sci. |
| Year of publication | 2015 |
| Journal volume | 6 |
| Journal issue | 9 |
| Pages of publication | 5230 |
| a | 12.8 ± 0.03 Å |
| b | 13.86 ± 0.04 Å |
| c | 14.36 ± 0.02 Å |
| α | 66.45 ± 0.07° |
| β | 79.9 ± 0.04° |
| γ | 67.84 ± 0.09° |
| Cell volume | 2162 ± 9 Å3 |
| Cell temperature | 100 ± 2 K |
| Ambient diffraction temperature | 100 ± 2 K |
| Number of distinct elements | 4 |
| Space group number | 2 |
| Hermann-Mauguin space group symbol | P -1 |
| Hall space group symbol | -P 1 |
| Residual factor for all reflections | 0.0843 |
| Residual factor for significantly intense reflections | 0.0692 |
| Weighted residual factors for significantly intense reflections | 0.1814 |
| Weighted residual factors for all reflections included in the refinement | 0.193 |
| Goodness-of-fit parameter for all reflections included in the refinement | 1.031 |
| Diffraction radiation wavelength | 0.6358 Å |
| Diffraction radiation type | monochromatedX-raysbeamlineX10SA@SLS |
| Has coordinates | Yes |
| Has disorder | Yes |
| Has Fobs | No |
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