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Information card for entry 1520601
Preview
| Coordinates | 1520601.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | C46 H70 N2 Si2 |
|---|---|
| Calculated formula | C46 H70 N2 Si2 |
| SMILES | [Si]([Si]=C1N(c2c(C(C)C)cccc2C(C)C)C(CC21CCCCC2)(C)C)=C1N(C(CC21CCCCC2)(C)C)c1c(cccc1C(C)C)C(C)C |
| Title of publication | A soluble molecular variant of the semiconducting silicondiselenide |
| Authors of publication | Chandra Mondal, Kartik; Roy, Sudipta; Dittrich, Birger; Maity, Bholanath; Dutta, Sayan; Koley, Debasis; Vasa, Suresh Kumar; Linser, Rasmus; Dechert, Sebastian; Roesky, Herbert W. |
| Journal of publication | Chem. Sci. |
| Year of publication | 2015 |
| Journal volume | 6 |
| Journal issue | 9 |
| Pages of publication | 5230 |
| a | 12.79 ± 0.02 Å |
| b | 13.783 ± 0.009 Å |
| c | 14.433 ± 0.019 Å |
| α | 66.35 ± 0.06° |
| β | 79.58 ± 0.1° |
| γ | 67.48 ± 0.07° |
| Cell volume | 2152 ± 5 Å3 |
| Cell temperature | 23 ± 2 K |
| Ambient diffraction temperature | 23 ± 2 K |
| Number of distinct elements | 4 |
| Space group number | 2 |
| Hermann-Mauguin space group symbol | P -1 |
| Hall space group symbol | -P 1 |
| Residual factor for all reflections | 0.1285 |
| Residual factor for significantly intense reflections | 0.0641 |
| Weighted residual factors for significantly intense reflections | 0.1418 |
| Weighted residual factors for all reflections included in the refinement | 0.1721 |
| Goodness-of-fit parameter for all reflections included in the refinement | 1.035 |
| Diffraction radiation wavelength | 0.4769 Å |
| Diffraction radiation type | synchrotron |
| Has coordinates | Yes |
| Has disorder | Yes |
| Has Fobs | No |
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