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Information card for entry 1575220
Preview
| Coordinates | 1575220.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | C56 H54 N2 O6 Si |
|---|---|
| Calculated formula | C56 H54 N2 O6 Si |
| Title of publication | What distinguishes the strength and the effect of a Lewis base: insights with a strong chromogenic silicon Lewis acid. |
| Authors of publication | Stoess, Lennart; Greb, Lutz |
| Journal of publication | Chemical science |
| Year of publication | 2025 |
| Journal volume | 16 |
| Journal issue | 34 |
| Pages of publication | 15387 - 15395 |
| a | 8.9542 ± 0.0005 Å |
| b | 14.7938 ± 0.0008 Å |
| c | 20.8352 ± 0.0011 Å |
| α | 106.669 ± 0.002° |
| β | 93.269 ± 0.002° |
| γ | 90.445 ± 0.002° |
| Cell volume | 2638.8 ± 0.2 Å3 |
| Cell temperature | 100 ± 2 K |
| Ambient diffraction temperature | 100 ± 2 K |
| Number of distinct elements | 5 |
| Space group number | 2 |
| Hermann-Mauguin space group symbol | P -1 |
| Hall space group symbol | -P 1 |
| Residual factor for all reflections | 0.0711 |
| Residual factor for significantly intense reflections | 0.0613 |
| Weighted residual factors for significantly intense reflections | 0.1615 |
| Weighted residual factors for all reflections included in the refinement | 0.1677 |
| Goodness-of-fit parameter for all reflections included in the refinement | 1.086 |
| Diffraction radiation probe | x-ray |
| Diffraction radiation wavelength | 0.71073 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
For the version history of this entry, please navigate to main COD server.
The link is: https://www.crystallography.net/1575220.html
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Users of the data should acknowledge the original authors of the
structural data.