Information card for entry 4032953
| Formula |
C14 H20 Se3 Si2 |
| Calculated formula |
C14 H20 Se3 Si2 |
| SMILES |
[se]1c2[se]c3[se]c([Si](C)(C)C)cc3c2cc1[Si](C)(C)C |
| Title of publication |
Diseleno[2,3-b:3',2'-d]selenophene and Diseleno[2,3-b:3',2'-d] thiophene: Building Blocks for the Construction of [7]Helicenes. |
| Authors of publication |
Xu, Wan; Wu, Longlong; Fang, Maohong; Ma, Zhiying; Shan, Zhen; Li, Chunli; Wang, Hua |
| Journal of publication |
The Journal of organic chemistry |
| Year of publication |
2017 |
| Journal volume |
82 |
| Journal issue |
20 |
| Pages of publication |
11192 - 11197 |
| a |
6.4642 ± 0.0019 Å |
| b |
20.855 ± 0.006 Å |
| c |
27.927 ± 0.008 Å |
| α |
90° |
| β |
90.498 ± 0.005° |
| γ |
90° |
| Cell volume |
3764.7 ± 1.9 Å3 |
| Cell temperature |
296 ± 2 K |
| Ambient diffraction temperature |
296 ± 2 K |
| Number of distinct elements |
4 |
| Space group number |
14 |
| Hermann-Mauguin space group symbol |
P 1 21/c 1 |
| Hall space group symbol |
-P 2ybc |
| Residual factor for all reflections |
0.1338 |
| Residual factor for significantly intense reflections |
0.0577 |
| Weighted residual factors for significantly intense reflections |
0.1149 |
| Weighted residual factors for all reflections included in the refinement |
0.1307 |
| Goodness-of-fit parameter for all reflections included in the refinement |
0.923 |
| Diffraction radiation wavelength |
0.71073 Å |
| Diffraction radiation type |
MoKα |
| Has coordinates |
Yes |
| Has disorder |
No |
| Has Fobs |
No |
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