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Information card for entry 4073913
Preview
| Coordinates | 4073913.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | C23 H24 O5 Os Si2 |
|---|---|
| Calculated formula | C23 H24 O5 Os Si2 |
| SMILES | [Os]1([Si](C)(C)c2cccc3c2Oc2c([Si]1(C)C)cccc2C3(C)C)(C#[O])(C#[O])(C#[O])C#[O] |
| Title of publication | Iron, Ruthenium, and Osmium Complexes Supported by the Bis(silyl) Chelate Ligand (9,9-Dimethylxanthene-4,5-diyl)bis(dimethylsilyl): Synthesis, Characterization, and Reactivity |
| Authors of publication | Minglana, Jim Josephus G.; Okazaki, Masaaki; Hasegawa, Kenji; Luh, Lung-Shiang; Yamahira, Nobukazu; Komuro, Takashi; Ogino, Hiroshi; Tobita, Hiromi |
| Journal of publication | Organometallics |
| Year of publication | 2007 |
| Journal volume | 26 |
| Journal issue | 24 |
| Pages of publication | 5859 |
| a | 12.311 ± 0.0007 Å |
| b | 10.0336 ± 0.0006 Å |
| c | 19.1542 ± 0.0019 Å |
| α | 90° |
| β | 93.018 ± 0.004° |
| γ | 90° |
| Cell volume | 2362.7 ± 0.3 Å3 |
| Cell temperature | 150 ± 2 K |
| Ambient diffraction temperature | 150 ± 2 K |
| Number of distinct elements | 5 |
| Space group number | 14 |
| Hermann-Mauguin space group symbol | P 1 21/n 1 |
| Hall space group symbol | -P 2yn |
| Residual factor for all reflections | 0.0356 |
| Residual factor for significantly intense reflections | 0.029 |
| Weighted residual factors for significantly intense reflections | 0.083 |
| Weighted residual factors for all reflections included in the refinement | 0.1056 |
| Goodness-of-fit parameter for all reflections included in the refinement | 1.182 |
| Diffraction radiation probe | x-ray |
| Diffraction radiation wavelength | 0.71069 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
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The link is: https://www.crystallography.net/4073913.html
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Users of the data should acknowledge the original authors of the
structural data.