Information card for entry 4073914

Structure parameters

• Formula: C52 H48 O16 Ru4 Si4
• Calculated formula: C52 H48 O16 Ru4 Si4
• SMILES: [Ru]1([Si](C)(C)c2cccc3c2Oc2c([Si]1(C)C)cccc2C3(C)C)(C#[O])(C#[O])(C#[O])C#[O].[Ru]12([Ru]([Ru]1(C#[O])(C#[O])(C#[O])C#[O])([Si](C)(C)c1cccc3c1Oc1c([Si]2(C)C)cccc1C3(C)C)(C#[O])(C#[O])C#[O])(C#[O])(C#[O])C#[O]
• Title of publication: Iron, Ruthenium, and Osmium Complexes Supported by the Bis(silyl) Chelate Ligand (9,9-Dimethylxanthene-4,5-diyl)bis(dimethylsilyl): Synthesis, Characterization, and Reactivity
• Authors of publication: Minglana, Jim Josephus G.; Okazaki, Masaaki; Hasegawa, Kenji; Luh, Lung-Shiang; Yamahira, Nobukazu; Komuro, Takashi; Ogino, Hiroshi; Tobita, Hiromi
• Journal of publication: Organometallics
• Year of publication: 2007
• Journal volume: 26
• Journal issue: 24
• Pages of publication: 5859
• a: 15.2588 ± 0.0009 Å
• b: 17.1038 ± 0.0011 Å
• c: 12.2358 ± 0.0006 Å
• α: 90.3239 ± 0.0019°
• β: 111.541 ± 0.002°
• γ: 103.163 ± 0.003°
• Cell volume: 2878.2 ± 0.3 ų
• Cell temperature: 296 ± 2 K
• Ambient diffraction temperature: 296 ± 2 K
• Number of distinct elements: 5
• Space group number: 2
• Hermann-Mauguin space group symbol: P -1
• Hall space group symbol: -P 1
• Residual factor for all reflections: 0.0389
• Residual factor for significantly intense reflections: 0.0314
• Weighted residual factors for significantly intense reflections: 0.0898
• Weighted residual factors for all reflections included in the refinement: 0.0947
• Goodness-of-fit parameter for all reflections included in the refinement: 1.041
• Diffraction radiation wavelength: 0.71069 Å
• Diffraction radiation type: MoKα
• Has coordinates: Yes
• Has disorder: No
• Has Fobs: No