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Information card for entry 4082430
Preview
| Coordinates | 4082430.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | C23 H11 O11 Os3 Sb |
|---|---|
| Calculated formula | C23 H11 O11 Os3 Sb |
| SMILES | [Os]1([Os]([OsH]([Sb]1(c1ccccc1)c1ccccc1)(C#[O])(C#[O])C#[O])(C#[O])(C#[O])(C#[O])C#[O])(C#[O])(C#[O])(C#[O])C#[O] |
| Title of publication | Oxidative Addition across Sb‒H and Sb‒Sb Bonds by an Osmium Carbonyl Cluster: Trapping the Intermediate |
| Authors of publication | Li, Ying-Zhou; Ganguly, Rakesh; Leong, Weng Kee |
| Journal of publication | Organometallics |
| Year of publication | 2014 |
| Journal volume | 33 |
| Journal issue | 3 |
| Pages of publication | 823 |
| a | 9.7693 ± 0.0009 Å |
| b | 16.097 ± 0.0014 Å |
| c | 17.6044 ± 0.0013 Å |
| α | 90° |
| β | 97.159 ± 0.004° |
| γ | 90° |
| Cell volume | 2746.8 ± 0.4 Å3 |
| Cell temperature | 103 ± 2 K |
| Ambient diffraction temperature | 103 ± 2 K |
| Number of distinct elements | 5 |
| Space group number | 14 |
| Hermann-Mauguin space group symbol | P 1 21/n 1 |
| Hall space group symbol | -P 2yn |
| Residual factor for all reflections | 0.0371 |
| Residual factor for significantly intense reflections | 0.0315 |
| Weighted residual factors for significantly intense reflections | 0.0817 |
| Weighted residual factors for all reflections included in the refinement | 0.0931 |
| Goodness-of-fit parameter for all reflections included in the refinement | 1.216 |
| Diffraction radiation wavelength | 0.71073 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
For the version history of this entry, please navigate to main COD server.
The link is: https://www.crystallography.net/4082430.html
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Users of the data should acknowledge the original authors of the
structural data.