Information card for entry 4084709
| Formula |
C29 H57 N S2 Si5 |
| Calculated formula |
C29 H57 N S2 Si5 |
| SMILES |
S1[Si]2(S/C1=N\c1c(cccc1C(C)C)C(C)C)C([Si](C)(C)C)([Si](C)(C)C)CCC2([Si](C)(C)C)[Si](C)(C)C |
| Title of publication |
Reactions of an Isolable Dialkylsilylene with Carbon Dioxide and Related Heterocumulenes |
| Authors of publication |
Liu, Xupeng; Xiao, Xu-Qiong; Xu, Zheng; Yang, Xuemin; Li, Zhifang; Dong, Zhaowen; Yan, Chenting; Lai, Guoqiao; Kira, Mitsuo |
| Journal of publication |
Organometallics |
| Year of publication |
2014 |
| Journal volume |
33 |
| Journal issue |
19 |
| Pages of publication |
5434 |
| a |
11.323 ± 0.002 Å |
| b |
11.883 ± 0.002 Å |
| c |
15.335 ± 0.003 Å |
| α |
77.249 ± 0.003° |
| β |
68.794 ± 0.003° |
| γ |
74.553 ± 0.003° |
| Cell volume |
1836.3 ± 0.6 Å3 |
| Cell temperature |
173 ± 2 K |
| Ambient diffraction temperature |
173 ± 2 K |
| Number of distinct elements |
5 |
| Space group number |
2 |
| Hermann-Mauguin space group symbol |
P -1 |
| Hall space group symbol |
-P 1 |
| Residual factor for all reflections |
0.073 |
| Residual factor for significantly intense reflections |
0.049 |
| Weighted residual factors for significantly intense reflections |
0.1412 |
| Weighted residual factors for all reflections included in the refinement |
0.1645 |
| Goodness-of-fit parameter for all reflections included in the refinement |
1.028 |
| Diffraction radiation wavelength |
0.71073 Å |
| Diffraction radiation type |
MoKα |
| Has coordinates |
Yes |
| Has disorder |
No |
| Has Fobs |
No |
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