Information card for entry 4084710
| Formula |
C29 H57 N O2 Si5 |
| Calculated formula |
C29 H57 N O2 Si5 |
| SMILES |
[Si]12(O/C(=N/c3c(cccc3C(C)C)C(C)C)O1)C([Si](C)(C)C)([Si](C)(C)C)CCC2([Si](C)(C)C)[Si](C)(C)C |
| Title of publication |
Reactions of an Isolable Dialkylsilylene with Carbon Dioxide and Related Heterocumulenes |
| Authors of publication |
Liu, Xupeng; Xiao, Xu-Qiong; Xu, Zheng; Yang, Xuemin; Li, Zhifang; Dong, Zhaowen; Yan, Chenting; Lai, Guoqiao; Kira, Mitsuo |
| Journal of publication |
Organometallics |
| Year of publication |
2014 |
| Journal volume |
33 |
| Journal issue |
19 |
| Pages of publication |
5434 |
| a |
11.397 ± 0.007 Å |
| b |
11.592 ± 0.006 Å |
| c |
15.405 ± 0.009 Å |
| α |
76.52 ± 0.014° |
| β |
70.677 ± 0.011° |
| γ |
73.386 ± 0.012° |
| Cell volume |
1818.7 ± 1.8 Å3 |
| Cell temperature |
296 ± 2 K |
| Ambient diffraction temperature |
296 ± 2 K |
| Number of distinct elements |
5 |
| Space group number |
2 |
| Hermann-Mauguin space group symbol |
P -1 |
| Hall space group symbol |
-P 1 |
| Residual factor for all reflections |
0.069 |
| Residual factor for significantly intense reflections |
0.0497 |
| Weighted residual factors for significantly intense reflections |
0.149 |
| Weighted residual factors for all reflections included in the refinement |
0.1764 |
| Goodness-of-fit parameter for all reflections included in the refinement |
0.971 |
| Diffraction radiation wavelength |
0.71073 Å |
| Diffraction radiation type |
MoKα |
| Has coordinates |
Yes |
| Has disorder |
No |
| Has Fobs |
No |
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