Information card for entry 4085729
| Formula |
C38 H44 Cl2 N O4 P Si |
| Calculated formula |
C38 H44 Cl2 N O4 P Si |
| SMILES |
P1(=[N]([Si](Cl)(Cl)(C(=C1C(=O)OC)C(=O)OC)C)c1c(cccc1C(C)C)C(C)C)(c1ccccc1)c1ccccc1.c1(ccccc1)C |
| Title of publication |
Fine Tuning of the Substituents on the N-Geminal Phosphorus/Silicon-Based Lewis Pairs for the Synthesis ofZ-Type Silyliminophosphoranylalkenes |
| Authors of publication |
Li, Jiancheng; Li, Yan; Purushothaman, Indu; De, Susmita; Li, Bin; Zhu, Hongping; Parameswaran, Pattiyil; Ye, Qingsong; Liu, Weiping |
| Journal of publication |
Organometallics |
| Year of publication |
2015 |
| Journal volume |
34 |
| Journal issue |
17 |
| Pages of publication |
4209 |
| a |
9.6383 ± 0.0007 Å |
| b |
12.1814 ± 0.0009 Å |
| c |
17.9861 ± 0.0014 Å |
| α |
70.303 ± 0.007° |
| β |
88.249 ± 0.006° |
| γ |
68.903 ± 0.007° |
| Cell volume |
1845 ± 0.3 Å3 |
| Cell temperature |
173 ± 2 K |
| Ambient diffraction temperature |
173 ± 2 K |
| Number of distinct elements |
7 |
| Space group number |
2 |
| Hermann-Mauguin space group symbol |
P -1 |
| Hall space group symbol |
-P 1 |
| Residual factor for all reflections |
0.0757 |
| Residual factor for significantly intense reflections |
0.0529 |
| Weighted residual factors for significantly intense reflections |
0.1162 |
| Weighted residual factors for all reflections included in the refinement |
0.128 |
| Goodness-of-fit parameter for all reflections included in the refinement |
1.051 |
| Diffraction radiation wavelength |
0.71073 Å |
| Diffraction radiation type |
MoKα |
| Has coordinates |
Yes |
| Has disorder |
No |
| Has Fobs |
No |
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