Information card for entry 4130660
| Formula |
C28 H36 I4 S4 Si4 |
| Calculated formula |
C28 H36 I4 S4 Si4 |
| SMILES |
Ic1sc([Si](C)(C)C)c2c3c(c4c(c5c(c12)c(I)sc5[Si](C)(C)C)c(sc4I)[Si](C)(C)C)c(I)sc3[Si](C)(C)C |
| Title of publication |
Thiophene-Based Double Helices: Syntheses, X-ray Structures, and Chiroptical Properties. |
| Authors of publication |
Zhang, Sheng; Liu, Xinming; Li, Chunli; Li, Lu; Song, Jinsheng; Shi, Jianwu; Morton, Martha; Rajca, Suchada; Rajca, Andrzej; Wang, Hua |
| Journal of publication |
Journal of the American Chemical Society |
| Year of publication |
2016 |
| Journal volume |
138 |
| Journal issue |
31 |
| Pages of publication |
10002 - 10010 |
| a |
10.775 ± 0.002 Å |
| b |
11.514 ± 0.003 Å |
| c |
18.195 ± 0.004 Å |
| α |
87.775 ± 0.004° |
| β |
86.31 ± 0.004° |
| γ |
67.205 ± 0.003° |
| Cell volume |
2076.5 ± 0.8 Å3 |
| Cell temperature |
293 ± 2 K |
| Ambient diffraction temperature |
293 ± 2 K |
| Number of distinct elements |
5 |
| Space group number |
2 |
| Hermann-Mauguin space group symbol |
P -1 |
| Hall space group symbol |
-P 1 |
| Residual factor for all reflections |
0.055 |
| Residual factor for significantly intense reflections |
0.0424 |
| Weighted residual factors for significantly intense reflections |
0.1071 |
| Weighted residual factors for all reflections included in the refinement |
0.1156 |
| Goodness-of-fit parameter for all reflections included in the refinement |
1.086 |
| Diffraction radiation wavelength |
0.71073 Å |
| Diffraction radiation type |
MoKα |
| Has coordinates |
Yes |
| Has disorder |
No |
| Has Fobs |
No |
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