Information card for entry 4130661
| Formula |
C28 H40 S4 Si4 |
| Calculated formula |
C28 H40 S4 Si4 |
| SMILES |
C[Si](C)(C)c1c2c(cs1)c1c(c3c(scc3c3c2c(sc3)[Si](C)(C)C)[Si](C)(C)C)c(sc1)[Si](C)(C)C |
| Title of publication |
Thiophene-Based Double Helices: Syntheses, X-ray Structures, and Chiroptical Properties. |
| Authors of publication |
Zhang, Sheng; Liu, Xinming; Li, Chunli; Li, Lu; Song, Jinsheng; Shi, Jianwu; Morton, Martha; Rajca, Suchada; Rajca, Andrzej; Wang, Hua |
| Journal of publication |
Journal of the American Chemical Society |
| Year of publication |
2016 |
| Journal volume |
138 |
| Journal issue |
31 |
| Pages of publication |
10002 - 10010 |
| a |
10.918 ± 0.006 Å |
| b |
12.793 ± 0.006 Å |
| c |
14.3 ± 0.007 Å |
| α |
91.596 ± 0.009° |
| β |
104.851 ± 0.009° |
| γ |
113.229 ± 0.009° |
| Cell volume |
1755.3 ± 1.5 Å3 |
| Cell temperature |
296 ± 2 K |
| Ambient diffraction temperature |
296 ± 2 K |
| Number of distinct elements |
4 |
| Space group number |
2 |
| Hermann-Mauguin space group symbol |
P -1 |
| Hall space group symbol |
-P 1 |
| Residual factor for all reflections |
0.1731 |
| Residual factor for significantly intense reflections |
0.0658 |
| Weighted residual factors for significantly intense reflections |
0.0935 |
| Weighted residual factors for all reflections included in the refinement |
0.1069 |
| Goodness-of-fit parameter for all reflections included in the refinement |
0.987 |
| Diffraction radiation wavelength |
0.71073 Å |
| Diffraction radiation type |
MoKα |
| Has coordinates |
Yes |
| Has disorder |
No |
| Has Fobs |
No |
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