Information card for entry 4131534

Structure parameters

• Formula: C44 H74 N2 Si2
• Calculated formula: C44 H74 N2 Si2
• SMILES: C1(C(CC(C)(C)N1c1c(cccc1C(C)C)C(C)C)(C)C)=[Si](C)(C)[Si](=C1C(CC(C)(C)N1c1c(cccc1C(C)C)C(C)C)(C)C)(C)C
• Title of publication: Organosilicon Radicals with Si-H and Si-Me Bonds from Commodity Precursors.
• Authors of publication: Kundu, Subrata; Samuel, Prinson P.; Sinhababu, Soumen; Luebben, Anna V.; Dittrich, Birger; Andrada, Diego M.; Frenking, Gernot; Stückl, A Claudia; Schwederski, Brigitte; Paretzki, Alexa; Kaim, Wolfgang; Roesky, Herbert W.
• Journal of publication: Journal of the American Chemical Society
• Year of publication: 2017
• Journal volume: 139
• Journal issue: 32
• Pages of publication: 11028 - 11031
• a: 17.9254 ± 0.0008 Å
• b: 11.6078 ± 0.0005 Å
• c: 20.4598 ± 0.0009 Å
• α: 90°
• β: 97.164 ± 0.003°
• γ: 90°
• Cell volume: 4223.9 ± 0.3 ų
• Cell temperature: 100 ± 2 K
• Ambient diffraction temperature: 100 ± 2 K
• Number of distinct elements: 4
• Space group number: 15
• Hermann-Mauguin space group symbol: C 1 2/c 1
• Hall space group symbol: -C 2yc
• Residual factor for all reflections: 0.0407
• Residual factor for significantly intense reflections: 0.0347
• Weighted residual factors for significantly intense reflections: 0.087
• Weighted residual factors for all reflections included in the refinement: 0.0925
• Goodness-of-fit parameter for all reflections included in the refinement: 1.048
• Diffraction radiation wavelength: 0.71073 Å
• Diffraction radiation type: MoKα
• Has coordinates: Yes
• Has disorder: Yes
• Has Fobs: No