Information card for entry 4517419
| Formula |
C26 H4 F14 S2 |
| Calculated formula |
C26 H4 F14 S2 |
| SMILES |
c1(ccc(c2c(c(c(c3ccc(c4c(c(c(c(c4F)F)F)F)F)s3)c(c2F)F)F)F)s1)c1c(c(c(c(c1F)F)F)F)F |
| Title of publication |
Fluorinated Thiophene-Phenylene Co-Oligomers for Optoelectronic Devices. |
| Authors of publication |
Sosorev, Andrey Yu; Trukhanov, Vasiliy A.; Maslennikov, Dmitry R.; Borshchev, Oleg V.; Polyakov, Roman A.; Skorotetcky, Maxim S.; Surin, Nikolay M.; Kazantsev, Maxim S.; Dominskiy, Dmitry I.; Tafeenko, Viktor A.; Ponomarenko, Sergey A.; Paraschuk, Dmitry Yu |
| Journal of publication |
ACS applied materials & interfaces |
| Year of publication |
2020 |
| Journal volume |
12 |
| Journal issue |
8 |
| Pages of publication |
9507 - 9519 |
| a |
7.5177 ± 0.0004 Å |
| b |
7.727 ± 0.0004 Å |
| c |
11.325 ± 0.0006 Å |
| α |
72.545 ± 0.003° |
| β |
77.25 ± 0.004° |
| γ |
63.092 ± 0.003° |
| Cell volume |
556.83 ± 0.05 Å3 |
| Cell temperature |
295 ± 2 K |
| Ambient diffraction temperature |
295 K |
| Number of distinct elements |
4 |
| Space group number |
2 |
| Hermann-Mauguin space group symbol |
P -1 |
| Hall space group symbol |
-P 1 |
| Residual factor for all reflections |
0.049 |
| Residual factor for significantly intense reflections |
0.0404 |
| Weighted residual factors for significantly intense reflections |
0.1049 |
| Weighted residual factors for all reflections included in the refinement |
0.1092 |
| Goodness-of-fit parameter for all reflections included in the refinement |
1 |
| Diffraction radiation wavelength |
1.54186 Å |
| Diffraction radiation type |
CuKα |
| Has coordinates |
Yes |
| Has disorder |
No |
| Has Fobs |
No |
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The link is:
https://www.crystallography.net/4517419.html
