Information card for entry 7104312

Structure parameters

• Formula: C28 H56 Hf N4 O8
• Calculated formula: C28 H56 Hf N4 O8
• SMILES: [Hf]1234(OC(=[N]2C(C)C)OC(C)C)(OC(OC(C)C)=[N]4C(C)C)(OC(OC(C)C)=[N]1C(C)C)OC(=[N]3C(C)C)OC(C)C
• Title of publication: Hafnium carbamates and ureates: new class of precursors for low-temperature growth of HfO2 thin films.
• Authors of publication: Pothiraja, Ramasamy; Milanov, Andrian P; Barreca, Davide; Gasparotto, Alberto; Becker, Hans-Werner; Winter, Manuela; Fischer, Roland A; Devi, Anjana
• Journal of publication: Chemical communications (Cambridge, England)
• Year of publication: 2009
• Journal volume: 34
• Journal issue: 15
• Pages of publication: 1978 - 1980
• a: 18.7586 ± 0.0002 Å
• b: 18.7004 ± 0.0002 Å
• c: 20.4731 ± 0.0002 Å
• α: 90°
• β: 90°
• γ: 90°
• Cell volume: 7181.83 ± 0.13 ų
• Cell temperature: 111 ± 2 K
• Ambient diffraction temperature: 111 ± 2 K
• Number of distinct elements: 5
• Space group number: 61
• Hermann-Mauguin space group symbol: P b c a
• Hall space group symbol: -P 2ac 2ab
• Residual factor for all reflections: 0.0621
• Residual factor for significantly intense reflections: 0.0299
• Weighted residual factors for significantly intense reflections: 0.0534
• Weighted residual factors for all reflections included in the refinement: 0.0686
• Goodness-of-fit parameter for all reflections included in the refinement: 1.301
• Diffraction radiation wavelength: 0.71073 Å
• Diffraction radiation type: MoKα
• Has coordinates: Yes
• Has disorder: No
• Has Fobs: No