Information card for entry 7104313

Structure parameters

• Formula: C28 H60 Hf N8 O4
• Calculated formula: C28 H60 Hf N8 O4
• SMILES: [Hf]1234([N](C(C)C)=C(N(C)CC)O2)([N](C(C)C)=C(N(C)CC)O4)(OC(=[N]1C(C)C)N(C)CC)[N](=C(N(C)CC)O3)C(C)C
• Title of publication: Hafnium carbamates and ureates: new class of precursors for low-temperature growth of HfO2 thin films.
• Authors of publication: Pothiraja, Ramasamy; Milanov, Andrian P; Barreca, Davide; Gasparotto, Alberto; Becker, Hans-Werner; Winter, Manuela; Fischer, Roland A; Devi, Anjana
• Journal of publication: Chemical communications (Cambridge, England)
• Year of publication: 2009
• Journal volume: 34
• Journal issue: 15
• Pages of publication: 1978 - 1980
• a: 11.1068 ± 0.0004 Å
• b: 19.5845 ± 0.0007 Å
• c: 16.2298 ± 0.0006 Å
• α: 90°
• β: 100.163 ± 0.003°
• γ: 90°
• Cell volume: 3474.9 ± 0.2 ų
• Cell temperature: 109 ± 2 K
• Ambient diffraction temperature: 109 ± 2 K
• Number of distinct elements: 5
• Space group number: 14
• Hermann-Mauguin space group symbol: P 1 21/n 1
• Hall space group symbol: -P 2yn
• Residual factor for all reflections: 0.0506
• Residual factor for significantly intense reflections: 0.0376
• Weighted residual factors for significantly intense reflections: 0.0518
• Weighted residual factors for all reflections included in the refinement: 0.0537
• Goodness-of-fit parameter for all reflections included in the refinement: 0.945
• Diffraction radiation wavelength: 0.71073 Å
• Diffraction radiation type: MoKα
• Has coordinates: Yes
• Has disorder: No
• Has Fobs: No