Information card for entry 7105222

Structure parameters

• Formula: C26 H38 N2 O4 Ru2 Si4
• Calculated formula: C26 H38 N2 O4 Ru2 Si4
• SMILES: [Ru]123([Si](C)(C)[Ru]4([Si]3(Cc5[n]1c(C[Si]2(C)C)ccc5)(C)Cc1[n]4c(ccc1)C[Si](C)(C)C)(C#[O])C#[O])(C#[O])C#[O]
• Title of publication: Thermal reaction of a ruthenium bis(silyl) complex having a lutidine-based Si,N,Si ligand: formation of a mu-silyl(mu-silylene) diruthenium complex involving a 3c-2e Ru-Si-C interaction.
• Authors of publication: Komuro, Takashi; Tobita, Hiromi
• Journal of publication: Chemical communications (Cambridge, England)
• Year of publication: 2010
• Journal volume: 46
• Journal issue: 7
• Pages of publication: 1136 - 1137
• a: 10.5784 ± 0.0005 Å
• b: 13.6191 ± 0.0005 Å
• c: 22.5534 ± 0.0009 Å
• α: 90°
• β: 99.2293 ± 0.0018°
• γ: 90°
• Cell volume: 3207.2 ± 0.2 ų
• Cell temperature: 150 ± 2 K
• Ambient diffraction temperature: 150 ± 2 K
• Number of distinct elements: 6
• Space group number: 14
• Hermann-Mauguin space group symbol: P 1 21/n 1
• Hall space group symbol: -P 2yn
• Residual factor for all reflections: 0.0491
• Residual factor for significantly intense reflections: 0.038
• Weighted residual factors for significantly intense reflections: 0.0876
• Weighted residual factors for all reflections included in the refinement: 0.0976
• Goodness-of-fit parameter for all reflections included in the refinement: 1.316
• Diffraction radiation wavelength: 0.71069 Å
• Diffraction radiation type: MoKα
• Has coordinates: Yes
• Has disorder: No
• Has Fobs: No